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Dr. Nalamasu received his B.S. in Chemistry and Biology from
Osmania University, India, in 1978, his M.S. in Chemistry from
the University of Hyderabad, India, in 1980, and his Ph.D. in
Chemistry from the University of British Columbia, Vancouver,
Canada, in 1986.
Before joining Rensselaer in 2002, Nalamasu held several key
research and development leadership positions in AT&T Bell
Laboratories, Bell Laboratories/Lucent Technologies, and Agere
Systems in Murray Hill, N.J. He previously served as director
of Bell Laboratories' Nanofabrication Research Laboratory in
Murray Hill. At Bell Labs and Agere, Nalamasu was a representative
to the SEMATECH Lithography Technical Working Group, Focus Technical
Advisory Board, and Resist Advisory Groups.
In 2003, Nalamasu received the NYSTAR (New York State Office
of Science, Technology, and Academic Research) Distinguished
Professor Award along with a $1 million grant from the Faculty
Development Program. Nalamasu has earned several other prestigious
awards, including the American Chemical Society (ACS) National
Award for Team Innovation for the Invention and Innovation of
193 nm (nanometer) Resist Material in 2000 and Japan's Photopolymer
Science and Technology Award in 1998. He and his technical team
also won an R&D 100 Award for Invention, Development, and
Commercialization of the first Deep-UV (ultraviolet) Chemically
Amplified Photoresist (CAMP) in 1997.
Nalamasu has published more than 170 papers, review articles,
and book chapters; he has received eleven patents and edited
two books. He also has organized and presented several invited
and plenary talks at national and international conferences,
including one by invitation for the National Academy of Engineering's
4th Annual Symposium on the Frontiers of Engineering in 1998.
In addition to his Rensselaer center directorship, Nalamasu
is the chief technical officer of the New Jersey Nanotechnology
Consortium, a public/private nonprofit enterprise he co-founded
to foster nanotechnology partnerships across academia, industry,
and government.
Nalamasu's primary research interests are in the areas of nanotechnology,
nanopatterning, electronic and photonic materials, and lithography
with special emphasis on applying patterning and materials know-how
for device fabrication. He is also interested in MEMs technology
and its utility in combination with nanotechnology for developing
novel sensors and devices.
Nalamasu has made seminal contributions to the fields of optical
lithography and polymeric materials science and technology.
His pioneering contributions to optical lithography and photoresist
materials science and technology have played a major role in
enabling the microelectronics revolution, especially where this
technology helped extend the boundaries of optical lithography
for patterning sub-100 nm design rule devices. His contributions
to the fundamental understanding of the structure-property relationships
between molecular structure of resist components and their relation
to resist properties, as well as his contributions to resist
materials chemistry and process development have played a defining
role in identifying novel resist materials and chemistries required
for implementation of deep-UV, 193 nm, and e-beam lithographic
technologies.
M.V. Kunavakkam, F.M. Houlihan, M. Schlax, J.A. Liddle, P. Kolodner,
J.A. Rogers, and O. Nalamasu, "Low-Cost, Low-Loss Micro-Lens
Arrays Fabricated by Soft-Lithography Replication Process,"
in press, Applied Physics Letters, (2003).
S. Yang, P. Mirau, C.S. Pai, O. Nalamasu, E. Reichmanis, J.
Seputro, Y.S. Obeng, E. Lin, and H.J. Lee, "Nanoporous
Ultralow Dielectric Constant Organosilicates Templated by Triblock
Copolymers," Chemistry of Materials, 14,
(1), 369-374, (2002).
E. Reichmanis and O. Nalamasu, "Testing the Limits of
Resists," Science, 297, 349-350, (2002).
E. Reichmanis, O. Nalamasu, and F.M. Houilhan, "Photoresponsive
Polymers: Applications in Electronics," in Encyclopedia
of Physical Science and Technology, (2001).
S. Pau, G.P. Watson, and O. Nalamasu, "Writing an Arbitrary
Non-Periodic Pattern Using Interference Lithography," Journal
of Modern Optics, 48, 1211-1223, (2001).
O. Nalamasu, F.M. Houlihan, E. Reichmanis, R. Cirelli, and
A. Timko, "An Overview of the Role of Materials Technology
for 193 nm Lithography," Polymer Material Science Engineering,
84, 207, (2001).
E. Reichmanis and O. Nalamasu, "Polymer Materials for
Microelectronics Imaging Applications," in Applied
Polymer Science, C.D. Craver, C.E. Carraher, Eds., Elsevier,
Oxford, 635-658, (2000).
G.P. Watson, I.C. Kizilyalli, O. Nalamasu, R.A. Cirelli, M.
Miller, Y.T. Wang, B. Pati, J. Radosevich, R. Kohler, F. Klemens,
W. Mansfield, H. Vaidya, A. Timko, L.E. Trimble, and J. Frackoviak,
"Implementing Advanced Lithography Technology: A 100 MHz,
1 Volt Digital Signal Processor Fabricated with Phase Shift
Technology," Journal of Vacuum Science and Technology
B, 18, 2877, (2000).
E. Reichmanis, O. Nalamasu, and F.M. Houlihan, "Organic
Materials Challenges for 193 nm Imaging," Accounts
of Chemical Research, 32, (8), 659, (1999).
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